Substrate temperature dependence of the structure of polythiophene thin films obtained by Matrix Assisted Pulsed Laser Evaporation (MAPLE).

BLOISI, FRANCESCO and ROSARIO MARIA VICARI, LUCIANO and BARRA, MARIO and CASSINESE, ANTONIO and FANELLI, ESTHER and CARELLA, ANTONIO and ROVIELLO, ANTONIO (2009) Substrate temperature dependence of the structure of polythiophene thin films obtained by Matrix Assisted Pulsed Laser Evaporation (MAPLE). [Pubblicazione su rivista scientifica]

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Abstract

Thin films of head-tail (H-T) regio-regular poly[3-(4-octyloxyphenyl) thiophene] (POOPT) were grown using the MAPLE (Matrix Assisted Pulsed Laser Evapn.) technique in which the target is a frozen soln. of the polymer in chloroform. Target evapn. was obtained by laser irradn. at 1064 nm and substrates were kept at different temps. Information concerning the preservation of the polymer local chem. structure following laser irradn. was obtained by FTIR (Fourier Transform IR) spectroscopy. Based on FTIR data, the chem. structure of the deposited polymer seemed to undergo little or no damage. From UV-Visible spectroscopic anal., it turned out that the degree of order of the film is strongly affected by the substrate temp.: the polymer was deposited in a disordered form on the substrate at room temp. whereas on the hot surface we locally obtained the .pi.-stacked structure characteristic of polythiophenes. Atomic force microscopy (AFM) images showed that the polymer formed aggregates of different dimensions (<1 .mu.m to 5 .mu.m) with a columnar shape and showed micrometric domains with sharp and apparently regular edges for the film grown on a hot substrate. Elec. measurements performed by a std. two-probe technique confirm that the structural order degree strongly affects the film charge transport properties.

Tipologia di documento:Pubblicazione su rivista scientifica
Parole chiave:Optical properties, Organic compounds, UV/Vis IR radiation effects
Settori scientifico-disciplinari MIUR:Non specificato
Stato del full text:Accessibilità ristretta
Data:2009
Altri Autori:Califano V., Bloisi F., Vicari L., Barra M., Cassinese A., Fanelli E., Buzio R., Valbusa U., Carella A., Roviello A.
Numero di pagine:8
Intervallo di pagina:10505/1-10505/8
Volume:48
Numero:1
Dipartimento o Struttura:Dipartimento di Scienze Fisiche
Numero identificativo:10.1051/epjap/2009130
Titolo rivista/pubblicazione:THE EUROPEAN PHYSICAL JOURNAL. APPLIED PHYSICS
Numero di sistema:7337
Depositato il:21 Ottobre 2010 08:56
Ultima modifica:21 Ottobre 2010 08:56

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