Matacena, Ilaria (2021) IMPEDANCE SPECTROSCOPY FOR INTERFACE CHARACTERIZATION IN SEMICONDUCTOR DEVICES. [Tesi di dottorato]

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Tipologia del documento: Tesi di dottorato
Lingua: English
Titolo: IMPEDANCE SPECTROSCOPY FOR INTERFACE CHARACTERIZATION IN SEMICONDUCTOR DEVICES
Autori:
Autore
Email
Matacena, Ilaria
ilaria.matacena@unina.it
Data: 14 Aprile 2021
Numero di pagine: 119
Istituzione: Università degli Studi di Napoli Federico II
Dipartimento: Ingegneria Elettrica e delle Tecnologie dell'Informazione
Dottorato: Information technology and electrical engineering
Ciclo di dottorato: 33
Coordinatore del Corso di dottorato:
nome
email
Riccio, Daniele
daniele.riccio@unina.it
Tutor:
nome
email
Daliento, Santolo
[non definito]
Data: 14 Aprile 2021
Numero di pagine: 119
Parole chiave: impedance spectroscopy; nyquist plot; capacitance-voltage curves
Settori scientifico-disciplinari del MIUR: Area 09 - Ingegneria industriale e dell'informazione > ING-INF/01 - Elettronica
Depositato il: 10 Mag 2021 23:44
Ultima modifica: 07 Giu 2023 11:00
URI: http://www.fedoa.unina.it/id/eprint/13871

Abstract

Impedance spectroscopy (IS) is a powerful tool to characterize devices since it allows to easily decouple the contribution of different interfaces existing in the device by only accessing the external terminals. The collected data are interpreted by means of equivalent electrical circuit. In this thesis, an automated procedure is developed to automatically extract lumped circuit parameters from impedance measured data, adding physical constraints deriving from experimental capacitance. In this work, Graphene-Silicon solar cells are characterized using impedance spectra, allowing to assess a new front contact technology that ameliorates these cells performance compared to the conventional. Impedance spectroscopy is also employed to characterize perovskite solar cells. The equivalent circuit coming from these devices allows to gain knowledge on perovskite layer and recombination mechanisms. An important focus of this thesis concerns capacitance versus voltage curves in forward bias region. This analysis is made using both experimental data and numerical results obtained from TCAD environment. This study is made on Metal-Semiconductor structure, finding the analytical expression of the forward bias capacitance peak and considering the effects of interface defects on capacitance behavior. The observation of multiple peaks arising in the high forward bias region suggests that interface properties are not uniform in the entire structure. Capacitance is also investigated in SiC MOSFETs devices permitting the TCAD model calibration and SiC/SiO2 interface characterization.

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