ItalianoClear Cookie - decide language by browser settings
in titoli, abstract e parole chiave
Ricerca
Simple Search
Advanced Search
Ultime accessioni
Browse
Browse by Author
Browse by Subject
Browse by Year
Browse by Type
Browse by Accessibilità del full-text
Informazioni
Policy
About
FAQ
Contatti

Mele, Luigi (2008) Characterization of helium implantation in silicon for the optimisation of static and dynamic behaviour of power diodes. [Tesi di dottorato] (Unpublished)

[img]
Preview
 PDF
Mele_Ingegneria_Elettronica_Telecomunicazioni.pdf
Download (1MB) | Preview
[error in script] [error in script]
Item Type: Tesi di dottorato
Resource language: English
Title: Characterization of helium implantation in silicon for the optimisation of static and dynamic behaviour of power diodes
Creators:
CreatorsEmail
Mele, LuigiUNSPECIFIED
Date: 2008
Date type: Publication
Number of Pages: 143
Institution: Università degli Studi di Napoli Federico II
Department: Ingegneria elettronica e delle telecomunicazioni
Dottorato: Ingegneria elettronica e delle telecomunicazioni
Ciclo di dottorato: 20
Coordinatore del Corso di dottorato:
nomeemail
Poggi, GiovanniUNSPECIFIED
Tutor:
nomeemail
Spirito, PaoloUNSPECIFIED
Date: 2008
Number of Pages: 143
Keywords: Helium; Lifetime; Dynamic avalanche
Settori scientifico-disciplinari del MIUR: Area 09 - Ingegneria industriale e dell'informazione > ING-INF/01 - Elettronica
Date Deposited: 31 Jul 2008
Last Modified: 30 Apr 2014 19:28
URI: http://www.fedoa.unina.it/id/eprint/2048
DOI: 10.6092/UNINA/FEDOA/2048

Downloads

Downloads per month over past year

Actions (login required)

View Item View Item

fedOA is powered by EPrints 3 which is developed by the School of Electronics and Computer Science at the University of Southampton. More information and software credits.