Amoruso, Salvatore and Bruzzese, Riccardo (2007) Substrate heating influence on plume propagation during pulsed laser deposition of complex oxides. [Pubblicazione in rivista scientifica]

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Item Type: Pubblicazione in rivista scientifica
Language: English
Title: Substrate heating influence on plume propagation during pulsed laser deposition of complex oxides
Creators:
CreatorsEmail
Amoruso, SalvatoreUNSPECIFIED
Bruzzese, RiccardoUNSPECIFIED
Autor/s: SAMBRI A; S. AMORUSO; WANG X; RADOVIC M; MILETTO GRANOZIO F; R. BRUZZESE
Date: 2007
Number of Pages: 3
Department: Scienze fisiche
Identification Number: 10.1063/1.2795792
Journal or Publication Title: APPLIED PHYSICS LETTERS
Publisher: American Institute of Physics:2 Huntington Quadrangle, Suite 1NO1:Melville, NY 11747:(800)344-6902, (631)576-2287, EMAIL: subs@aip.org, INTERNET: http://www.aip.org, Fax: (516)349-9704
Date: 2007
Volume: 91
Page Range: 151501-1-151501-3
Number of Pages: 3
Identification Number: 10.1063/1.2795792
Date Deposited: 20 Oct 2010 08:35
Last Modified: 30 Apr 2014 19:42
URI: http://www.fedoa.unina.it/id/eprint/6905

Abstract

We investigate the effects of the substrate-heater temperature on the expansion dynamics of laser plumes of complex oxides in oxygen atmosphere. We observed a considerable reduction of the background gas resistance to plume propagation as the substrate temperature was increased, leading to a remarkable change in the velocity of the species impacting the substrate during film growth. The deposition temperature thus influences film growth not only through its direct thermal effect on surface kinetics of adatoms, but also by affecting the energetic properties of the precursors in the gas phase. We interpret the results with a simplified model of plume front propagation, accounting for the change in the background gas density induced by the substrate temperature. © 2007 American Institute of Physics.

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