Romano, Francesco (2010) Analysis of Flow Fields in a Deposition Chamber by a Molecular Approach. [Tesi di dottorato] (Inedito)

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Tipologia del documento: Tesi di dottorato
Lingua: English
Titolo: Analysis of Flow Fields in a Deposition Chamber by a Molecular Approach
Autori:
AutoreEmail
Romano, Francesco[non definito]
Data: 23 Novembre 2010
Numero di pagine: 139
Istituzione: Università degli Studi di Napoli Federico II
Dipartimento: Ingegneria aerospaziale
Scuola di dottorato: Ingegneria industriale
Dottorato: Ingegneria aerospaziale, navale e della qualità
Ciclo di dottorato: 23
Coordinatore del Corso di dottorato:
nomeemail
Moccia, Antonio[non definito]
Tutor:
nomeemail
Zuppardi, Gennaro[non definito]
Data: 23 Novembre 2010
Numero di pagine: 139
Parole chiave: 47.45.-n, 02.70.Uu, 47.70.Fw, 81.15.-z
Settori scientifico-disciplinari del MIUR: Area 09 - Ingegneria industriale e dell'informazione > ING-IND/06 - Fluidodinamica
Depositato il: 02 Dic 2010 21:44
Ultima modifica: 30 Apr 2014 19:43
URI: http://www.fedoa.unina.it/id/eprint/7915
DOI: 10.6092/UNINA/FEDOA/7915

Abstract

In this Ph.D Thesis a computing procedure is proposed as possible tool to simulate and analyze the flow field in a thin film deposition apparatus similar to the van de Sanden deposition apparatus at the University of Eindhoven. A sensitivity analysis of test parameters (electrical power supplied to the torch, precursor mass flow rate, thermo-fluid-dynamic quantities at the inlet chamber section by means of different nozzle geometry) on fluidics is evaluated. More over a method is proposed for a very preliminary evaluation of the film thickness distribution on the substrate and the influence of the above test parameters on film distribution is carried out. The computing procedure is based on two codes working in tandem. The first code is a pre-processor and simulates the flow field in the torch, where Argon is ionized according to the Saha’s equation and in part of the nozzle. The second code is the commercial DS2V code based on Direct Simulation Monte Carlo method and simulates the flow field in the remaining part of nozzle and in the whole chamber. Gas is a mixture of 21 chemical species and 24 chemical reactions from Argon plasma and Acetylene are implemented in both codes. Results show that the effects of the electrical power as well as of the mass flow rate look to be not very strong on the shock wave intensity, while are not negligible on the shock wave thickness. For what concern the film distribution, the sensitivity analysis verifies that the higher is electrical power and the precursor mass flow rate, the ticker and less uniform is the film.

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