Esposito, Emilia Maria (2010) Realization and characterization of silicon nitride thin films embedding Si nanoparticles. [Tesi di dottorato] (Unpublished)

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Item Type: Tesi di dottorato
Resource language: English
Title: Realization and characterization of silicon nitride thin films embedding Si nanoparticles
Creators:
Creators
Email
Esposito, Emilia Maria
em.esposito@gmail.com
Date: 30 November 2010
Number of Pages: 128
Institution: Università degli Studi di Napoli Federico II
Department: Scienze fisiche
Scuola di dottorato: Ingegneria industriale
Dottorato: Tecnologie innovative per materiali, sensori ed imaging
Ciclo di dottorato: 23
Coordinatore del Corso di dottorato:
nome
email
Andreone, Antonello
andreone@unina.it
Tutor:
nome
email
Mercaldo, Lucia Vittoria
lucia.mercaldo@enea.it
Date: 30 November 2010
Number of Pages: 128
Keywords: Si nanoparticles, silicon nitride, quantum confinement, Raman spectroscopy, photoluminescence, PECVD
Settori scientifico-disciplinari del MIUR: Area 02 - Scienze fisiche > FIS/03 - Fisica della materia
Area 02 - Scienze fisiche > FIS/01 - Fisica sperimentale
Area 09 - Ingegneria industriale e dell'informazione > ING-IND/22 - Scienza e tecnologia dei materiali
Additional information: Istituzione: C. R. ENEA - Portici
Date Deposited: 09 Dec 2010 13:24
Last Modified: 30 Apr 2014 19:45
URI: http://www.fedoa.unina.it/id/eprint/8288
DOI: 10.6092/UNINA/FEDOA/8288

Collection description

This thesis concerns the realization and characterization of silicon nitride thin films embedding Si nanoparticles. The objectives are: 1) to investigate convenient fabrication procedures in application perspective, 2) to improve upon the characterization techniques regarding this material class, and 3) to possibly provide a proof of concept study of quantum confinement to support the implementation of new-generation optoelectronic devices (among which, in particular, the all-silicon tandem solar cells). Different fabrication approaches have been followed: a simpler in-situ route by Plasma Enhanced Chemical Vapour Deposition and a procedure involving a post-deposition annealing step. The samples have been characterized through photoluminescence (at different excitation energies and temperatures), extensive Raman spectroscopy, FTIR, optical absorption, and EFTEM. The research activity has been carried out at ENEA - Portici Research Center in the “Photovoltaic Technologies Section” (now “Portici Technical Unit”).

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