Pagliarulo, Vito (2010) Electron Beam Lithography patterning of superconducting and magnetic nanostructures for novel optical and spintronic devices. [Tesi di dottorato] (Unpublished)

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Item Type:	Tesi di dottorato
Lingua:	English
Title:	Electron Beam Lithography patterning of superconducting and magnetic nanostructures for novel optical and spintronic devices
Creators:	Creators Email Pagliarulo, Vito pagliarulo@na.infn.it
Date:	30 November 2010
Number of Pages:	123
Institution:	Università degli Studi di Napoli Federico II
Department:	Scienze fisiche
Scuola di dottorato:	Ingegneria industriale
Dottorato:	Tecnologie innovative per materiali, sensori ed imaging
Ciclo di dottorato:	23
Coordinatore del Corso di dottorato:	nome email Andreone, Antonello andreone@unina.it
Tutor:	nome email Pepe, Giovanni Piero gpepe@na.infn.it Esposito, Emanuela UNSPECIFIED
Date:	30 November 2010
Number of Pages:	123
Uncontrolled Keywords:	ebl, permalloy, domanin wall, magnetoresistance, sspd
Settori scientifico-disciplinari del MIUR:	Area 02 - Scienze fisiche > FIS/03 - Fisica della materia
Date Deposited:	09 Dec 2010 13:39
Last Modified:	30 Apr 2014 19:46
URI:	http://www.fedoa.unina.it/id/eprint/8439
DOI:	10.6092/UNINA/FEDOA/8439

Abstract

In this thesis novel, high-end superconducting and spintronic devices have been fabricated and characterized. In summary, the proposed work has been focused on the realization of nanowires, and more generally nanostructures, using the Electron Beam Lithography. Such a technology offers a powerful solution for nanofabrication able to conjugate spatial resolution, operation flexibility, and costs. Two main research fields has been explored: superconductive nanowires for advanced optical detection and nanostructures for magneto-resistance based devices.

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