Pagliarulo, Vito (2010) Electron Beam Lithography patterning of superconducting and magnetic nanostructures for novel optical and spintronic devices. [Tesi di dottorato] (Unpublished)

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Item Type: Tesi di dottorato
Uncontrolled Keywords: ebl, permalloy, domanin wall, magnetoresistance, sspd
Date Deposited: 09 Dec 2010 13:39
Last Modified: 30 Apr 2014 19:46
URI: http://www.fedoa.unina.it/id/eprint/8439

Abstract

In this thesis novel, high-end superconducting and spintronic devices have been fabricated and characterized. In summary, the proposed work has been focused on the realization of nanowires, and more generally nanostructures, using the Electron Beam Lithography. Such a technology offers a powerful solution for nanofabrication able to conjugate spatial resolution, operation flexibility, and costs. Two main research fields has been explored: superconductive nanowires for advanced optical detection and nanostructures for magneto-resistance based devices.

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